Tae Hun Chung

Department of Physics

Dong-A University

Plasma processing is widely used in the microelectronic industry for thin film material (metal, semiconductor, and insulators) deposition and etching at sub-0.25 micron dimensions.  This course is designed to address the fundamental physical and engineering aspects of a plasma and its applications.  

Course Information:

Prerequisite
Syllabus for undergraduate course
Syllabus for graduate course
Recommended Textbook: Principles of Plasma Discharges and Material Processing by Lieberman and Lichtenberg, Wiley 1994 (ISBN: 0471005770) 

Recommended References:

- Glow Discharge by Chapman, Wiley 1986
- Introduction to Plasma Physics and Controlled Fusion by F. F. Chen, Vol. 1, 2nd edition, Plenum, 1984.  

Sample Homework:

?Homework and Solution

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