Jin Hee Bae, Jong Jin Mun, Min Jeong Seong, Sun Ja Kim, Hea Min Joh, and T. H. Chung, Effects of duty ratio on liquid- and polymer-surface treatment by a unipolar microsecond-pulsed helium atmospheric-pressure plasma jet, Phys. Plasmas 30, 043515 (2023) [PDF ]
Sun Ja Kim, Min-Jeong Seong, Jong-Jin Mun, Jin-Hee Bae, Hea-Min Joh and Tae Hun Chung, Differential Sensitivity of Melanoma Cells and Their Non-Cancerous Counterpart to Cold Atmospheric Plasma-Induced Reactive Oxygen and Nitrogen Species, Int. J. Mol. Sci., 23, 14092 (2022) [PDF ]
Ara Jo, Hea Min Joh, Jin Hee Bae, Sun Ja Kim, Tae Hun Chung, and J. W. Chung, Plasma activated medium prepared by a bipolar microsecond-pulsed atmospheric pressure plasma jet array induces mitochondria-mediated apoptosis in human cervical cancer cells, PLoS One 0272805 (2022) [PDF ]
Ara Jo, Jin Hee Bae, Yu Jeong Yoon, Tae Hun Chung, Eun-Woo Lee, Young-Ho Kim, Hea Min Joh, and J. W. Chung, Plasma-activated medium induces ferroptosis by depleting FSP1 in human lung cancer cells, Cell death and Disease 13:212 (2022) [PDF ]
Ara Jo, Hea Min Joh, T. H. Chung, and J. W. Chung , Anti-cancer effects of the plasma-activated medium produced by a microwave-excited atmospheric pressure argon plasma jet, Oxidative Medicine Cellular Longevity, 4205640 (2020) [PDF ]
Ara Jo, Hea Min Joh, J. W. Chung, and T. H. Chung, Cell viability and measurement of reactive species in gas- and liquid-phase exposed by a microwave-excited atmospheric pressure argon plasma jet, Cur. Appl. Phys. 20, 562 (2020) [PDF ]
Hea Min Joh, Eun Jeong Baek, Sun Ja Kim, and T. H. Chung, Effects of the pulse width and oxygen admixture on the production of reactive species in gas- and liquid-phases exposed by bipolar microsecond-pulsed atmospheric pressure helium plasma jets, Phys. Plasmas 26, 053509 (2019) [PDF ]
Dong Yeong Kim, Sun Ja Kim, Hea Min Joh, and T. H. Chung, Characterization of an atmospheric pressure plasma jet array and its application to cancer cell treatment using plasma activated medium, Phys. Plasmas 25, 073505 (2018) [PDF ]
J. Choi, I. S. Eom, Sun Ja Kim, Y. W. Kwon, Hea Min Joh, B. S. Jeong, and T. H. Chung, Characterization of a microwave-excited atmospheric-pressure argon plasma jet using two-parallel-wires transmission line resonator, Phys. Plasmas 24, 093516 (2017) [PDF ]
Hea Min Joh, Ji Ye Choi, Sun Ja Kim, Tae Hong Kang, and T. H. Chung, Effects of the pulse width on the reactive species production and DNA damage in cancer cells exposed to atmospheric pressure microsecond-pulsed helium plasma jets, AIP Advances 7, 085106 (2017) [PDF ]
Hae Ra Kang, T. H. Chung, Hea Min Joh, and Sun Ja Kim, Effects of Dielectric Tube Shape and Pin-electrode Diameter on the Plasma Plume in Atmospheric Pressure Helium Plasma Jets, IEEE Trans on Plasma Sci. 45, 691 (2017)[PDF ]
Eun Jeong Baek, Hea Min Joh, Sun Ja Kim, and T. H. Chung, Effects of the electrical parameters and gas flow rate on the generation of reactive species in liquids exposed to atmospheric pressure plasma jets, Phys. Plasmas 23, 073515 (2016) [PDF ]
Ji Ye Choi, Hea Min Joh, Jeong-Min Park, Min Ji Kim, Tae Hun Chung, Tae-Hong Kang, Non-thermal plasma-induced apoptosis is modulated by ATR- and PARP1-mediated DNA damage responses and circadian clock, Oncotarget 7, 32980 (2016) [PDF ]
Sun Ja Kim and T. H. Chung, Cold atmospheric plasma jet-generated RONS and their selective effects on normal and carcinoma cells, Sci. Rep. 6, 20332 (2016) [PDF ]
Sun Ja Kim and T. H. Chung, Plasma effects on the generation of reactive oxygen and nitrogen species in cancer cells in-vitro exposed by atmospheric pressure pulsed plasma jets, Appl. Phys. Lett. 107, 063702 (2015) [PDF ]
Sun Ja Kim, Tae Hun Chung, Hea Min Joh, Ju-Hong Cha, In Sub Eom, and Ho-Jun Lee, Characteristics of Multiple Plasma Plumes and Formation of Bullets in an Atmospheric-Pressure Plasma Jet Array, IEEE Trans on Plasma Sci. 43, 753 (2015)[PDF ]
T. H. Chung, Planar Sheath Model in Dusty Plasmas with a Two-temperature Electron Distribution, J. Korean Phys. Soc. 65,1873 (2014) [PDF ]
H. M. Joh, H. R. Kang, T. H. Chung, and S. J. Kim, Electrical and Optical Characterization of Atmospheric-Pressure Helium Plasma Jets Generated With a Pin Electrode: Effects of the Electrode Material, Ground Ring Electrode, and Nozzle Shape, IEEE Trans on Plasma Sci. 42, 3656 (2014)[PDF ]
Joh,H.M., Choi, J.Y., Kim, S.J., Chung, T.H. and Kang, T.-H. Effect of additive oxygen gas on cellular response of lung cancer cells induced by atmospheric pressure helium plasma jet, Sci. Rep. 4, 6638 (2014)[PDF ]
Min Woo Seo, Min Keun Bae, and T. H. Chung, Comparison of various interpretation methods of the electric probe measurements in inductively coupled Ar and O2 plasmas, Phys. Plasmas 21,023514 (2014) [PDF ]
T. H. Chung, Modeling a planar sheath in dust-containing plasmas, Phys. Plasmas 21,013701 (2014) [PDF ]
J.-W. Kim, S.-G. Cho, M.-K. Bae, H.-J. Kim, T. H. Chung, and K.-S. Chung, Analysis of Electron Temperature in DC Ar/SF6 Plasma Using Cylindrical and Planar Probes, Japan J. Appl. Phys. 52, 11NC03 (2013) [PDF ]
Sun Ja Kim, Hea Min Joh, and T. H. Chung, Production of intracellular reactive oxygen species and change of cell viability induced by atmospheric pressure plasma in normal and cancer cells, Appl. Phys. Lett. 103, 153705 (2013) [PDF ]
Hea Min Joh, Sun Ja Kim, T. H. Chung, and S. H. Leem, Comparison of the characteristics of atmospheric pressure plasma jets using different working gases and applications to plasma-cancer cell interactions, AIP Advances 3, 092128 (2013) [PDF ]
Min Kim, M. G. Kim, S. R. Kim, H. Y. Chung, J. G. Choi, Hea Min Joh, T. H. Chung, Hyung Soo Kim, and Y. Kim, Effective Surface Modification of a Germanium Layer by using an Atmospheric Pressure Plasma Jet with a Round Ended Nozzle, J. Korean Phys. Soc. 63, 996 (2013) [PDF ]
T. H. Chung, Hae Ra Kang, and Min Keun Bae, Optical emission diagnostics with electric probe measurements of inductively coupled Ar/O2/Ar-O2 plasmas, Phys. Plasmas 19,113502 (2012)[PDF ]
Jae Min Park, Min A Song, and T. H. Chung, Emission Spectroscopy Combined with a Single and a Double Probe in Low-pressure Inductively-coupled Nitrogen-Argon Plasmas, J. Korean Phys. Soc. 61, 376 (2012) [PDF ]
Hea Min Joh, Sun Ja Kim, T. H. Chung, and S. H. Leem, Reactive oxygen species-related plasma effects on the apoptosis of human bladder cancer cells in atmospheric pressure pulsed plasma jets, Appl. Phys. Lett. 101, 053703 (2012) [PDF ]
Young Wook Lee, Hye-lan Lee, and T.H. Chung, Dissociation fraction in low-pressure inductively coupled N2-Ar and O2-Ar plasmas, Current Applied Physics 11 S187 (2011)[PDF ]
Sun Ja Kim and T. H. Chung, Effects of control parameters on plasma bullet propagation in a pulsed atmospheric pressure argon plasma jet, IEEE trans on Plasma Sci. 39, 2280 (2011)[PDF ]
T. H. Chung, Y. W. Lee, H. M. Joh, and M. A. Song, Pressure dependence of dissociation fraction and optical emission characteristics in low-pressure inductively coupled N2-Ar plasmas, AIP ADVANCES 1, 032136 (2011)[PDF ]
Y. W. Lee, H. L. Lee, and T. H. Chung, E - H mode transition in low-pressure inductively coupled nitrogen-argon and oxygen-argon plasmas, J. Appl. Phys. 109, 113302 (2011)[PDF ]
M. A. Song, Y. W. Lee, and T. H. Chung, Characterization of an inductively coupled nitrogen-argon plasma by Langmuir probe combined with optical emission spectroscopy, Phys. Plasmas 18, 023504 (2011)[PDF ]
H. M. Joh, T. H. Chung, and K.-S. Chung, Electrostatic probe measurement of low-pressure electronegative SF6 discharges, Thin Solid Films 518, 6686 (2010)[PDF ]
Sun Ja Kim, T. H. Chung, S. H. Bae, S. H. Leem, Induction of apoptosis in human breast cancer cells by a pulsed atmospheric pressure plasma jet, Appl. Phys. Lett. 97, 023702 (2010) (selected for Virtual Journal of Biological Physics Research, July 15 (2010))[PDF ]
Sun Ja Kim, T. H. Chung, and S. H. Bae, Striation and plasma bullet propagation in an atmospheric pressure plasma jet, Phys. Plasmas 17, 053504 (2010)[PDF ]
Hye Sun Park, Sun Ja Kim, H. M. Joh, T. H. Chung, S. H. Bae, and S. H. Leem, Optical and electrical characterization of an atmospheric pressure microplasma jet with a capillary electrode, Phys. Plasmas 17, 033502 (2010)[PDF ]
C. J. Chung, T. H. Chung, Y. M. Shin, Y. Kim, Characteristics of Nitrogen-incorporated Silicon Oxycarbide Films and Plasmas for Plasma Enhanced Chemical Vapor Deposition with TMOS/N2/NH3, Current Applied Physics 10, 428 (2010)[PDF ]
Sun Ja Kim, T. H. Chung, S. H. Bae, and S. H. Leem, Characterization of Atmospheric Pressure Microplasma Jet Source and Its Application to Bacterial Inactivation, Plasma Processes and Polymers 6, 676 (2009)[PDF ]
T. H. Chung, Modeling the Plasma-sheath Boundary for a Cylindrical Probe in Electronegative Plasmas, J. Korean Phys. Soc. 54, 2282 (2009)[PDF ]
T. H. Chung, Modeling positive ion current to a planar probe in low-pressure electronegative discharges, Phys. Plasmas 16, 063503 (2009)[PDF ]
S. J. Kim, T. H. Chung, H. S. Park, and S. H. Bae, Fabrication of the Atmospheric-pressure Micro Plasma Jets for Biomedical Applications, Sae-mulli (The korean Physical Society) 58. 445 (2009)[PDF ]
S. J. Kim, T. H. Chung, S. H. Bae, Characteristic Study of Atmospheric pressure Microplasma Jets with Various Operating Conditions, Thin Solid Films 517, 4251 (2009)[PDF ]
Sun Ja Kim, T. H. Chung, S. H. Bae, and S. H. Leem, Bacterial inactivation using atmospheric pressure single pin electrode microplasma jet with a ground ring, Appl. Phys. Lett. 94, 141502 (2009)[PDF ]
T. H. Chung , M. S. Kang, C. J. Chung, and Y. Kim, Effects of process parameters on the properties of silicon oxide films using plasma enhanced chemical vapor deposition with tetramethoxysilane, Current Applied Physics 9, 598 (2009)[PDF ]
S. Y. Kang, T. H. Chung, and K.-S. Chung, Three point method to characterize low-pressure electronegative discharges using electrostatic probe, Rev. Sci. Instrum. 80, 013502 (2009)[PDF ]
Y. M. Shin, E. Y. Kim, and T. H. Chung, Measurement of the Degree of Dissociation in Inductively Coupled Nitrogen Discharges by Using Optical Emission Actinometry and Mass Spectrometry, J. Korean Phys. Soc 53, 617-623 (2008)[PDF ]
T. H. Chung, Effects of collisions and finite ion temperature on the sheath structure of cylindrical probe in low-pressure electronegative discharges, J. Appl. Phys. 103, 123302 (2008)[PDF ]
T. H. Chung and Y. M. Shin, Theoretical Model of Cylindrical Langmuir Probe for Low-Pressure Electronegative Discharges, Comp. Phys. Comm. 177, 127 (2007)[PDF ]
C. J. Chung, T. H. Chung, M. S. Kang, and Y. Kim, Electrical and Optical Properties of Nitrogen-incorporated Silicon-oxide Films by Using Plasma-enhanced Chemical-vapor Deposition with Tetramethoxysilane /N2O/NH3 gas, J. Korean Phys. Soc 49, 162-166 (2006)[PDF ]
T. H. Chung, Y. M. Shin, and D. C. Seo, Comparison of Two Methods of Interpretation of Langmuir Probe Data for an Inductively Coupled Oxygen Plasma, Contrib. Plasma Phys. 46, 348-353 (2006)[PDF ]
M. S. Kang, T. H. Chung, and Y. Kim, Plasma enhanced chemical vapor deposition of nitrogen-incorporated silicon oxide films using TMOS/N2O gas, Thin Solid Films 506-507, 45-49 (2006)[PDF ]
H. J. Yoon, T. H. Chung, C. J. Chung, and J. K. Lee, Two-dimensional Calculation of Spatial Distribution of Neutral Atoms for a Planar Inductively Coupled Oxygen Discharge, Thin Solid Films 506-507, 454-459 (2006)[PDF ]
Kyu Man Cha, Young Dae Kim, Jung Hyun Kang, Jae-Yel Yi, Hong Jun Bark, Tae Hun Chung and Yong Kim, Time Resolved Photoluminescence Study on Silicon Nitride/Silicon-Rich-Oxide Superlattices Grown by Using Ion-Beam Sputtering Deposition, J. Korean Phys. Soc. 48, 297-301 (2006)[PDF ]
T.H. Chung, Sheath structure for cylindrical probe in low-pressure electronegative discharges, Phys. Plasmas 13, 024501 (2006)[PDF ]
T.H. Chung, Scaling laws for dual radio-frequency capacitively coupled discharge, Phys. Plasmas 12, 104503 (2005)[PDF ]
J. K. Kim, K. M. Cha, J. H. Kang, Y. Kim, J. Y. Yi,, T. H. Chung, and H. J. Bark, The influence of secondary ion beam irradiation on the formation of Si nanocrystals during dual ion beam sputtering, Thin Solid Films 478, 116-120 (2005)[PDF ]
J. K. Kim, K. M. Cha, J. H. Kang, Y. D. Kim, Y. Kim, H. J. Bark, J. Y. Yi, and T. H. Chung, Selective Formation of Si Nanocrystals by Assist Ion Beam Irradiation, J. Korean Phys. Soc. 45, S728-S731 (2004) [PDF ]
J. H. Kang, Y. D. Kim, K. M. Cha, H. J. Jeong, Y. Kim, J. Y. Yi, H. J. Bark, and T. H. Chung, Electroluminescence Properties of Nanocrystal Si/SiO2 Superlattice Grown by Rapid Thermal Chemical Vapor Deposition, J. Korean Phys. Soc. 45, 1065-1068 (2004) [PDF ]
S. B. Bang, T. H. Chung, Y. Kim, M. S. Kang and J. K. Kim, Effects of the oxygen fraction and substrate bias power on the electrical and optical properties of silicon oxide films by plasma enhanced chemical vapour deposition using TMOS/O2 gas, J. Phys. D:Appl. Phys. 37, 1679-1684 (2004) [PDF ]
J. K. Kim, K. M. Cha, H. J. Jeong, Y. Kim, J. Y. Yi, T. H. Chung, and H. J. Bark , Area Selective formation of Si nanocrystals by assisted ion-beam irradiation during dual-ion-beam deposition, Appl. Phys. Lett. 85, 1595-1597 (2004) [PDF ]
H. J. Yoon and T. H. Chung, Calculation of Radial Profiles of Oxygen Atoms in High-Density Oxygen Discharges, J. Korean Phys. Soc. 44, 1033-1038 (2004) [PDF ]
S. B. Bang, T. H. Chung, Y. Kim, Plasma enhanced chemical vapor deposition of silicon oxide films using TMOS/O2 gas and plasma diagnostics, Thin Solid Films 444, 125-131 (2003) [PDF ]
H. J. Cheong, J. H. Kang, J. K. Kim, Y. Kim, J. Y. Yi, T. H. Chung, and H. J. Bark, Formation of luminescent Si nanocrystals by high-temperature rapid thermal chemical vapor deposition, Appl. Phys. Lett. 83, 2922-2924 (2003) [PDF ]
Y. Kim, H. J. Cheong, K. H. Park, T. H. Chung, H. J. Bark, J. Y. Yi, S. H. Bang and J. H. Cho, Charge retention characteristics in a metal-insulator-semiconductor capacitor containing Ge nanocrystals, Semicon. Sci. Technol. 17, 1039-1043 (2002)
K. H. Park, Y. Kim, T. H. Chung, H. J. Bark and J. Y. Yi, Electrical and Structural Properties of Si Nanocrystals Prepared by Ion-Beam-Assisted Electron Beam Deposition, J. Korean Phys. Soc. 39, S283-S286 (2001)[PDF ]
T. H. Chung, D.C. Seo, G. H. Kim, J. S. Kim, Scaling Relations of Plasma Parameters for Low Pressure Oxygen rf Discharge Plasmas, IEEE trans on Plasma Sci. 29, 970 - 973 (2001) [PDF ]
D. C. Seo and T. H. Chung, Observation of the transition of the operating regions in a low-pressure inductively coupled oxygen plasma by Langmuir probe measurement and optical emission spectroscopy, J. Phys. D 34, 2854 - 2861 (2001) [PDF ]
H. J. Yoon and T. H. Chung, Time-dependent Global Modeling of Pulse-Power-Modulated Low Pressure Oxygen Plasma, J. Korean Phys. Soc. 39, 271-279 (2001) [PDF ]
Y. Kim, K. H. Park, W. C. Choi, T. H. Chung, H.J. Bark, J. Y. Yi, J. Jeong, Charge retention effect in metal-oxide-semiconductor structure containing Si nanocrystals prepared by ion-beam-assisted electron beam deposition, Material Science and Engineering B 83, 145-151 (2001)
Y. Kim, K. H. Park, T. H. Chung, H.J. Bark, J. Y. Yi, W .C. Choi, E .K. Kim, Electrical properties of metal-oxide-semiconductor structures containing Si nanocrystals fabricated by rapid thermal oxidation process, J. Korean Vac. Soc. Vol. 10, 44-50 (2001)
D. C. Seo, T. H. Chung, H. J. Yoon, G. H. Kim, Electrostatic Probe Diagnostics of a Planar Type Radio Frequency Inductively Coupled Oxygen Plasma, J. Appl. Phys. 89, 4218 - 4224 (2001) [PDF ]
Y. Kim, K. H. Park, T. H. Chung, H. J. Bark, W. C. Choi, E. K. Kim, J. W. Lee, J. Y. Lee, Ultralarge capacitance-voltage hysteresis and charge retention characteristics in metal oxide semiconductor structure containing nanocrystals deposited by ion-beam-assisted electron beam deposition, Appl. Phys. Lett. 78, 934 - 936 (2001) [PDF ]
J. S. Kim, G. H. Kim, T. H. Chung, G. Y. Yeom, and K. H. Kwon, Characterization of oxygen plasmas by using a Langmuir probe in the inductively coupled plasma, J. Korean Phys. Soc. 38, 259 - 263 (2001) [PDF ]
A. J. Lichtenberg, M. A. Lieberman, I. G. Kouznetsov, and T. H. Chung, Transitions and Scaling Laws for electronegative discharge models, Plasma Sources Sci. Technol. 9, 45 - 56 (2000) [PDF ]
H. J. Yoon and T. H. Chung, One-dimensional Equilibrium Model for an Ar-O2 mixture plasma, J. Accel. Plasma Res. Vol. 5, No. 2, 218-229 (2000)
H. J. Yoon, T. H. Chung, and D.C. Seo, Two-dimensional Fluid Simulation and Langmuir Probe Measurement of a Planar Inductively Coupled Oxygen Plasma, Jpn. J. Appl. Phys. Vol. 38, 6890- 6895 (1999) [PDF ]
T. H. Chung, H. J. Yoon and D. C. Seo, Global Model and Scaling Laws for Inductively Coupled Oxygen Plasmas, J. Appl. Phys. 86, 3536 - 3542 (1999) [PDF ]
J. S. Lee and T. H. Chung, Characteristics calculations on radio frequency power transfer in a planar inductively coupled plasma source, J. Korean Vacuum Soc. Vol. 8, 368 - 375 (1999).
T. H. Chung, Scaling Behavior of Electronegative rf Discharge Plasmas, J. Korean Phys. Soc. Vol. 34, 24 - 28 (1999).[ PDF ]
H. J. Yoon and T. H. Chung, One-dimensional Analysis of Electronegative Discharge Plasmas with Four Charged Species, J. Korean Phys. Soc. Vol. 34, 29 - 35 (1999). [PDF ]
C. H. Shon, J. K. Lee, H. J. Lee, Y. Yang, and T. H. Chung, Velocity Distributions in Magnetron Sputter , IEEE Trans. on Plasma Science 26, 1635 - 1644 (1998). [PDF ]
T. H. Chung and H. J. Yoon, Period Doubling and the Chaotic region in RF-excited Plasmas , J. Korean Phys. Soc. 31, 364 -368 (1997). [PDF ]
J. K. Lee, L. Meng, Y. K. Shin, H. J. Lee, and T. H. Chung, Modeling and Simulation of a Large Area Plasma Source , Jpn. J. Appl. Phys. 36, 5714 - 5723 (1997).[PDF ]
T. H. Chung, S. H. Lee, and J. K. Lee, A Time-Dependent Global Modeling Combined with Equivalent Circuit Analysis , Ungyong Mulli(Kor. J. Appl. Phys.) 10, 40 - 47 (1997).
T. H. Chung, H. J. Yoon, T. S. Kim, and J. K. Lee, Particle-in-cell Simulation on the Breakdown and Period Doubling Thresholds for RF-Discharge Ar Plasma , J. Phys. D 29, 1014 - 1020 (1996). [PDF ]
Y. S. Lee, H. J. Yoon, T. H. Chung, and J. K. Lee, Particle-in-Cell Simulation of Plasma-Immersed Ion Implantation with Various Electrode Geometries , Ungyong Mulli (Korean Journal of Applied Physics) 9 (1), 14 - 23 (1996).
T. H. Chung and J. K. Lee, Growth Rate Calculation and one-dimensional Simulation of an Electromagnetically Pumped FEL, J. Korean Phys. Soc. 28 (8), 734 - 739 (1995)[PDF ].
T. H. Chung, H. S. Yoon, and J. K. Lee, Scaling Laws Verification for capacitive rf-Discharge Ar Plasma using Particle-in-cell Simulation J. Appl. Phys. 78 (11), 6441 - 6447 (1995) [PDF ]
E. H. Park, J. K. Lee, and T. H. Chung, Self Oscillations and Chaos of free-electron laser oscillators with space charge effect , Nucl. Instr. Methods in Phys. Res. A358 (4) 448 - 451 (1995).
K. H. Yeom, J. K. Lee, and T. H. Chung, Wiggler-free FEL with an intense helical beam, Nucl. Instr. Methods in Phys. Res. A358 ABS 52-53 (1995).[PDF ]
T. H. Chung and J. K. Lee, 1-D Simulation Model of an FEL with a Plasma Background , Nucl. Instr. Methods in Phys. Res. A358 ABS 3- 4 (1995).[PDF ]
T. H. Chung, Interaction of a Gyrating Free-electron with a Single-Mode Quantized Electromagnetic Field , J. Phys. Soc. Jpn. 63 (5), 1769 - 1774,(1994).[PDF ]
T. H. Chung and J. K. Lee, Dispersion characteristics of EM pumped FEL, Nucl. Instr. Methods in Phys. Res. A341 ABS 70-71 (1994)
S. J. Hahn, J.K. Lee, E.H. Park, and T.H. Chung, Chaotic Transitions in a Short-Pulse FEL Oscillator, Nucl. Instr. Meth. A 341, 200 (1994)
T. H. Chung and J. K. Lee, One-dimensional Calculation including the Space Charge Effect of FEL Amplifier , J. Phys. Soc. Jpn. 62 (7), 2501 - 2510 (1993).[PDF ]
T. H. Chung, H. S. Kim, and J. K. Lee, Simulation of Tapered FEL Amplifier in Millimeter and Infra-red Regions, Nucl. Instr. Methods in Phys. Res. A331 (4) 480 - 487 (1993).
Tae Hun Chung, Analysis of the Stimulated Cyclotron Resonance Scattering of right handed circularly polarized pump by relativistic electron beam, J. Kor. Phys. Soc. 24, No.6. 460 - 466 (1991)[PDF ]
B.M. So, J.K. Kim, T.H. Chung, and S.Y. Lee, Theoretical Characteristics of Free Electron Laser with an Axial Guide Field,J. Kor. Phys. Soc. 23, No.2, 199 - 208 (1990)[PDF ]
Tae Hun Chung and Jin Hyun Lee, Analysis of the ac Free-electron Laser, IEEE Trans. Plasma Sci. 18, No.3, 651 - 657 (June 1990)[PDF ]
Tae Hun Chung and Hyung Jin Kim, Gain Calculation for a Tapered Free-electron Laser with an Axial Guide Field, J. Kor. Phys. Soc. 22, No. 3, 306 - 312 (1989)[PDF ]
Tae Hun Chung, Quantum Theory of Free-electron Lasers, Sing. J. Phys.6, No. .2, 13 - 20 (1989)
Tae Hun Chung, Influence of Ion Slip on the Magnetohydrodynamics in a Duct, J. Kor. Phys. Soc. 21, No.3, 341 - 344 (1988)[PDF ]
Tae Hun Chung, Linear Cold Fluid Model of a Free-electron Laser with an Axial Guide Field, J. Kor. Phys. Soc. 21, No.3, 322 - 325 (1988)[PDF ]
Tae Hun Chung, Multi-photon Absorption Cross Section for a Maxwellian Electron Gas in a Uniform Magnetic Field, J. Kor. Phys. Soc. 20, No. 3, 249 - 259 (1987)[PDF ]